Fabmatics and SCI announce a joint solution for automated reticle logistics in semiconductor fabs. The approach combines handling, transport, storage, and retrieval of reticle pods to improve process reliability and efficiency.
Why Reticle Logistics Matters in Lithography
Lithography is one of the most critical and capital-intensive processes in semiconductor manufacturing. Reticles—also known as photomasks or masks - are at the heart of this process. As master templates for chip design, they are among the most valuable assets in a fab. Yet, their management often receives less attention than it deserves.
With thousands of reticles in circulation and up to 50 exposure layers per product, manual handling introduces contamination risks, inefficiencies, and costly delays. Even a minor scratch or mix-up can silently compromise entire wafer lots before the issue is detected.
To address these challenges, SCIO members Fabmatics and SCI have partnered to deliver a fully integrated automation solution for reticle handling, transport, storage, and retrieval—ensuring maximum uptime, yield protection, and operational efficiency.
HERO Scout and SCI Linear Stocker: A Proven Combination
Together, these systems create a full-stack solution that delivers:
- Contamination-free transport and storage
- On-time reticle availability at the stepper
- Maximum uptime and throughput
- Centralized control and MES integration
- ISO-compliant design and SEMI-standard connectivity
As part of the SCIO Group’s Cleanroom Technologies segment, Fabmatics and SCI combine expertise and innovation to help fabs reduce downtime, improve yield, and optimize personnel resources.
Discover how Fabmatics and SCI are redefining lithography automation with integrated solutions for reticle logistics and beyond.